BRAND NEW Advances in Chemical Mechanical Planarization (CMP)
Suryadevara Babu is distinguished professor and director of CAMP at Clarkson University, USA. His research interests include CMP of Cu, Ta and SiO2, CMP for shallow-trench isolation, particle-free solutions for CMP and post-CMP cleaning. Clarkson University, Potsdam, NY, USA. This item is in the category "Books & Magazines\Books". The seller is "linus3884" and is located in this country: US. This item can be shipped to United States.
Publication Year: 2016
Series: Woodhead Publishing Series in Electronic and Optical Materials Ser.
Publication Name: Advances in Chemical Mechanical Planarization (Cmp)